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dc.rights.licenseAtribución-NoComercial 4.0 Internacional
dc.contributor.authorMarulanda Cardona, Diana Maritza
dc.contributor.authorOlaya Flórez, Jhon Jairo
dc.date.accessioned2019-06-28T09:36:29Z
dc.date.available2019-06-28T09:36:29Z
dc.date.issued2012
dc.identifier.urihttps://repositorio.unal.edu.co/handle/unal/40597
dc.description.abstractIn this work, an unbalanced magnetron sputtering system which allows for the production of corrosion resistance multilayer coatings is described. The major advantage of this system is that it combines features such as a multi-cathode setup, temperature control, control over the rotation of the sample holder, and the ability to change samples without breaking the vacuum. The system was tested with the production of Cr/CrN nanometric multilayers on AISI stainless steel 304 and silicon (100) substrates and the evaluation of its corrosion resistance. X-ray diffraction (XRD) was used in order to assess the crystalline microstructure and scanning electron microscopy (SEM) was used to characterize multilayer formation. The XRD results show (111) and (200) orientations for CrN multilayer films and the SEM results clearly show the formation of a multilayer structure. Corrosion resistance was evaluated through electrochemical studies and the results show that the Cr/CrN multilayer structure presents lower corrosion current and higher corrosion potential as compared to the stainless steel 304 substrate.
dc.format.mimetypeapplication/pdf
dc.language.isospa
dc.publisherUniversidad Nacional de Colombia Sede Medellín
dc.relationhttp://revistas.unal.edu.co/index.php/dyna/article/view/29572
dc.relation.ispartofUniversidad Nacional de Colombia Revistas electrónicas UN Dyna
dc.relation.ispartofDyna
dc.relation.ispartofseriesDyna; Vol. 79, núm. 171 (2012); 74-79 DYNA; Vol. 79, núm. 171 (2012); 74-79 2346-2183 0012-7353
dc.rightsDerechos reservados - Universidad Nacional de Colombia
dc.rights.urihttp://creativecommons.org/licenses/by-nc/4.0/
dc.titleUnbalanced magnetron sputtering system for producing corrosion resistance multilayer coatings
dc.typeArtículo de revista
dc.type.driverinfo:eu-repo/semantics/article
dc.type.versioninfo:eu-repo/semantics/publishedVersion
dc.identifier.eprintshttp://bdigital.unal.edu.co/30694/
dc.relation.referencesMarulanda Cardona, Diana Maritza and Olaya Flórez, Jhon Jairo (2012) Unbalanced magnetron sputtering system for producing corrosion resistance multilayer coatings. Dyna; Vol. 79, núm. 171 (2012); 74-79 DYNA; Vol. 79, núm. 171 (2012); 74-79 2346-2183 0012-7353 .
dc.rights.accessrightsinfo:eu-repo/semantics/openAccess
dc.subject.proposalunbalanced magnetron sputtering (UBM)
dc.subject.proposalcorrosion
dc.subject.proposalmultilayers
dc.subject.proposalCr/CrN
dc.type.coarhttp://purl.org/coar/resource_type/c_6501
dc.type.coarversionhttp://purl.org/coar/version/c_970fb48d4fbd8a85
dc.type.contentText
dc.type.redcolhttp://purl.org/redcol/resource_type/ART
oaire.accessrightshttp://purl.org/coar/access_right/c_abf2


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Atribución-NoComercial 4.0 InternacionalThis work is licensed under a Creative Commons Reconocimiento-NoComercial 4.0.This document has been deposited by the author (s) under the following certificate of deposit